NEWS: ProSys Announces Replacement for legacy Verteq/Marteq Megasonic Sunburst. Find out more!

DNS Scrubber Brush Replacement Kit

Our MegPie™ Acoustics technology modernizes legacy systems, including the DNS (Screen) 80A/B Scrubber Brush, delivering substantial enhancements in both performance and efficiency.

Legacy Brush and Nozzle Issues

Single-Wafer Brush Issues

  • Not particle neutral, adders increase with brush aging
  • Contact allows for cross contamination (lot-to-lot, wafer-to-wafer)
  • Throughput, downtime for brush changes
  • Brush requalification after change
  • Repeatability of process
  • Monitoring of process parameters

Binary Nozzles Issue

  • Accelerated fluid droplets knock particle away
  • Force applied limited by droplet mass and momentum
  • No direct process feedback/control
  • Limited process applications:
  • Standard SC1 Chemistry (not possible via nozzle)
  • Post-CMP cleaning (hard cleans) limited
  • Solvent Applications LIGA Liftoff or Develop processes
  • HF and other Chemistries not Possible
  • High Temperature Processes not Possible

The V3 MegPie™

Advantages of Non-contact Cleaning Through Sophisticated and Controlled Megasonic Technology

Radially uniform field applies even dosage

  • PRE ≥ 98% at 19 nm
  • Every portion of the wafer
  • Every time

Single crystal sapphire resonator

  • Flexible chemistry
  • Zero particles added
  • No surface pitting
  • Stainless steel for ignitable solvents

Monitors many process KPI & conditions

  • Dosage
  • Reflected power
  • Temperature
  • Load impedance
  • Bond integrity

Low operating costs with MegPie

  • MTBF = 208,290 hours
  • No PM, No consumables
  • Less than 1 lpm process fluid for 300mm wafer

Closed loop RF circuit monitors performance

  • Bond is part of the RF circuit
  • Sputtered film electrodes & spring-loaded contacts
  • Redundant RTDs monitor PZT

Patented metallic bond

  • The bond is durable & repairable
  • Dissipates heat generated
  • Tolerates difference in coefficient of thermal expansion

IMPulse™ Controller

Provides Real-Time Process Data

  • Real-time process measurement
  • Host controller integration without software modification
  • Continuous wave and pulsed output capability
  • Analog, RS-232, & Ethernet connectivity
  • Seamless integration into Fab SPC (Statistical Process Control) through ethernet

Brush Replacement Kit

Features for the 200mm MegPie™

  • Complete replacement of Brush Arm: replacement MegPie™ arm bolts directly to DNS Brush Arm actuator.
  • Sapphire MegPie™ integrated into arm with Fluid Dispense Manifold.
  • Radial Fluid Dispense Manifold allows 100 rpm operation with low fluid use (<0.6 lpm)
  • Brush rinse module replaced with holding station for the Sapphire MegPie™
  • IMPulse™ controller provides for independent process control monitoring and will output an alarm to the Scrubber if process parameters fall out of preset conditions.
  • No Software changes required, uses existing brush position commands and on/off signals from the scrubber.
  • IMPulse™ can be installed in a remote location (sub floor or remote rack)

Installed Kit

The MegPie™ is shown installed on the cleaning arm, in the correct position for the cleaning process. It’s positioned directly over the wafer for effective cleaning. The images also show the replacement of standard brush wash station.

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Test Results

Summary and Conclusions of a Partner comparing brush, binary nozzle, and the MegPie™ for PRE. Fresh and aged wafers were compared for particle removal efficiency (PRE). Equipment used was a Screen 80B Tool retrofit with the MegPie™ Kit.

  • The MegPie™ outperforms brush and binary nozzle cleaning technologies

Get in touch with us!

Contact us for product demos, cleaning solutions, distributor opportunities, or any queries about our company and products. Let’s start the conversation and find the answers you need.

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