NEWS: ProSys Announces Replacement for legacy Verteq/Marteq Megasonic Sunburst. Find out more!

MegPie™ V3

The MegPie™ V3 megasonic transducer is for non-contact cleaning or sonochemical processing a single rotating substrate. It applies a radially uniform dose of acoustic energy to improve process results with low operating costs. Operating conditions are continuously measured to ensure consistent outcomes.

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  • PRE ≥ 98% for particles down to 19 nm
  • Every portion of the wafer
  • For every wafer processed
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  • Chemistry flexibility
  • Zero particles added
  • No surface pitting
  • Stainless steel for solvent applications
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  • MTBF ≥ 209,000 hours
  • No PM, no consumables
  • Less than 1 lpm process fluid for 300mm wafer
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  • Sonic dosage
  • Reflected power
  • Temperature
  • Electrical parameters

Industry standard for FEOL / BEOL particle removal •  post-CMP cleaning • mask cleaning • pre-bond cleaning • post-dicing cleaning • MEMS cleaning